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JINXING MATECH CO LTD
JINXING MATECH is an expert provider on the metal solution. Especially on the products such as Tungsten Alloy , Tungsten copper , Titanium , Zirconium, Vanadium, Hafnium, Sputtering target , Nobel
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PVD Thin Film Coating Molybdenum Sputtering Targets

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PVD Thin Film Coating Molybdenum Sputtering Targets

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Brand Name : JINXING

Model Number : Molybdenum Sputtering Target

Certification : ISO 9001

Place of Origin : China

MOQ : 1kg

Payment Terms : L/C, D/A, D/P, T/T, Western Union

Supply Ability : 100000kgs/M

Delivery Time : 10～25 work days

Packaging Details : Plywood case

Material : Molybdenum Sputtering Target

Color/Appearance : Grey, Metallic

Size : Customized

Application : PVD Coating system

Shape : round, target,disc

Grain Size : Fine Grain Size, Good density

Purity : 99.95%

Density : 10.2g/cm3

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Molybdenum Sputtering Target for Thin Film Coating

Product Description:

1. Grade: Mo1,TZM,MoNb alloy.

2. Purity :> =99.95%

3. Characteristic:

Melting Point: 2610°C

Boiling Point:5560°C

Density: 10.2g/cm3

High quality, workability

4. Certificate: ISO9002

5. Product Feature: High melting point, High-density, high temperature oxidation resistance, long service life, resistance to corrosion.

The melting point of coated molybdenum sputtering target is 2610℃ and boiling point is 5560 ℃. And the purity of it can up to 99.95%.

Coated molybdenum sputtering target has a lot of advantages such as high melting point, high physical strength, high elasticity modulus, great thermal conductivity and corrosion resistance and so on.

Application:

· Electronical industry as PCB coating;

· Flat Panel Display industry as LCD coating;

· Optical coating

· Electronic semiconductor

· Sputtering material & vacuum coating;

· PVD film coating etc.

Product Name Element Purirty Melting Point ℃ Density (g/cc) Available Shapes
High Pure Sliver Ag 4N-5N 961 10.49 Wire, Sheet, Particle, Target
High Pure Aluminum Al 4N-6N 660 2.7 Wire, Sheet, Particle, Target
High Pure Gold Au 4N-5N 1062 19.32 Wire, Sheet, Particle, Target
High Pure Bismuth Bi 5N-6N 271.4 9.79 Particle, Target
High Pure Cadmium Cd 5N-7N 321.1 8.65 Particle, Target
High Pure Cobalt Co 4N 1495 8.9 Particle, Target
High Pure Chromium Cr 3N-4N 1890 7.2 Particle, Target
High Pure Copper Cu 3N-6N 1083 8.92 Wire, Sheet, Particle, Target
High Pure Ferro Fe 3N-4N 1535 7.86 Particle, Target
High Pure Germanium Ge 5N-6N 937 5.35 Particle, Target
High Pure Indium In 5N-6N 157 7.3 Particle, Target
High Pure Magnesium Mg 4N 651 1.74 Wire, Particle, Target
High Pure Magnesium Mn 3N 1244 7.2 Wire, Particle, Target
High Pure Molybdenum Mo 4N 2617 10.22 Wire, Sheet, Particle, Target
High Pure Niobium Nb 4N 2468 8.55 Wire, Target
High Pure Nickel Ni 3N-5N 1453 8.9 Wire, Sheet, Particle, Target
High Pure Lead Pb 4N-6N 328 11.34 Particle, Target
High Pure Palladium Pd 3N-4N 1555 12.02 Wire, Sheet, Particle, Target
High Pure Platinum Pt 3N-4N 1774 21.5 Wire, Sheet, Particle, Target
High Pure Silicon Si 5N-7N 1410 2.42 Particle, Target
High Pure Tin Sn 5N-6N 232 7.75 Wire, Particle, Target
High Pure Tantalum Ta 4N 2996 16.6 Wire, Sheet, Particle, Target
High Pure Tellurium Te 4N-6N 425 6.25 Particle, Target
High Pure Titanium Ti 4N-5N 1675 4.5 Wire, Particle, Target
High Pure Tungsten W 3N5-4N 3410 19.3 Wire, Sheet, Particle, Target
High Pure Zinc Zn 4N-6N 419 7.14 Wire, Sheet, Particle, Target
High Pure Zirconium Zr 4N 1477 6.4 Wire, Sheet, Particle, Target

Molybdenum Sputtering Target Picture:

PVD Thin Film Coating Molybdenum Sputtering Targets

PVD Thin Film Coating Molybdenum Sputtering Targets


Product Tags:

Molybdenum Sputtering Targets

      

PVD Coating Sputtering Targets

      

99.95% Purity Sputtering Targets

      
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